Company Filing History:
Years Active: 2013-2014
Title: Hailong Yao: Innovator in Double Patterning Lithography
Introduction
Hailong Yao is a prominent inventor based in La Jolla, California. He has made significant contributions to the field of lithography, particularly in the area of double patterning techniques. With a total of 2 patents, Yao's work focuses on optimizing layout decomposition processes.
Latest Patents
One of Hailong Yao's latest patents is titled "Layout decomposition for double patterning lithography." This invention provides systems and methods for layout decomposition to produce exposure layouts suitable for double patterning lithography (DPL). The preferred embodiment methods are executed by a computer and utilize integer linear programming (ILP) formulations. The invention aims to reduce the total cost of layout decomposition by addressing aspects that contribute to the costs associated with conventional DPL techniques. It includes formulations for integer linear programming (ILP), phase conflict detection (PCD), and node election bipartization (NBD) to optimize DPL layout decomposition. The process-aware cost function developed in this invention avoids small jogging line-ends and maximizes overlap at dividing points of polygons. Additionally, it allows for preferential splits at landing pads, junctions, and long runs.
Career Highlights
Hailong Yao is affiliated with the University of California, where he continues to advance research in lithography and related technologies. His innovative approaches have garnered attention in the academic and industrial sectors.
Collaborations
Yao collaborates with notable professionals in his field, including Andrew B. Kahng, enhancing the impact of his research and inventions.
Conclusion
Hailong Yao's contributions to double patterning lithography exemplify the importance of innovation in technology. His work not only addresses current challenges but also paves the way for future advancements in the field.