Company Filing History:
Years Active: 2013
Title: Haek-seung Han: Innovator in Photomask Technology
Introduction
Haek-seung Han is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of optical engineering, particularly in the area of photomask technology. His innovative methods have the potential to enhance the precision of photolithography processes used in semiconductor manufacturing.
Latest Patents
Haek-seung Han holds a patent for "Methods of correcting optical parameters in photomasks." This patent describes a method that includes providing a photomask, exposing it, detecting an aerial image to estimate the photomask, and irradiating gas cluster ion beams to the photomask based on the estimation result. This process aims to correct the optical parameters in relation to the aerial image. The gas cluster ion beams can be directed to either the front surface of the photomask, where the mask pattern is formed, or the rear surface, where the mask pattern is not present.
Career Highlights
Han is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has allowed him to apply his expertise in optical engineering to real-world applications, contributing to advancements in semiconductor technology.
Collaborations
Some of his notable coworkers include Dong-Seok Nam and Sang-Gyun Woo, who have collaborated with him on various projects related to photomask technology.
Conclusion
Haek-seung Han's innovative work in correcting optical parameters in photomasks showcases his significant contributions to the field of optical engineering. His patent reflects a commitment to enhancing the precision of semiconductor manufacturing processes.