Gyeong Seop Kim

Title: Gyeong Seop Kim: Innovator in Semiconductor Fabrication

Introduction

Gyeong Seop Kim is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods in optical proximity correction.

Latest Patents

Gyeong Seop Kim holds a patent for an "Optical proximity correction method and method of fabricating a semiconductor device using the same." This patent describes a method for fabricating semiconductor devices that includes performing optical proximity correction (OPC) on design patterns of a layout to generate a corrected layout. The process involves forming a photoresist pattern on a substrate using a photomask manufactured based on the corrected layout. The OPC process includes generating develop targets for the design patterns, selecting first object patterns based on distances between the develop targets, and performing a first OPC operation to create first correction patterns. Additionally, it involves choosing second object patterns while considering distances between the first correction patterns and a target error, followed by a second OPC operation to generate second correction patterns.

Career Highlights

Gyeong Seop Kim is currently employed at Samsung Electronics Co., Ltd., where he continues to advance semiconductor fabrication techniques. His work has been instrumental in enhancing the efficiency and accuracy of semiconductor manufacturing processes.

Collaborations

Gyeong Seop Kim collaborates with Noyoung Chung, contributing to the innovative projects at Samsung Electronics Co., Ltd. Their teamwork exemplifies the collaborative spirit essential in the field of technology and innovation.

Conclusion

Gyeong Seop Kim's contributions to semiconductor technology through his patented methods highlight his role as an influential inventor in the industry. His work not only advances the field but also sets a foundation for future innovations in semiconductor fabrication.