Wayne, NJ, United States of America

Guojin Lu


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Guojin Lu: Innovator in Radiation-Sensitive Materials

Introduction

Guojin Lu is a notable inventor based in Wayne, NJ (US). He has made significant contributions to the field of radiation-sensitive materials, particularly through his innovative patent.

Latest Patents

Guojin Lu holds a patent for a groundbreaking invention titled "Nanoparticle dispersion to improve radiation sensitivity." This patent describes a radiation-sensitive material that comprises a support and a radiation-sensitive composition on the support. The composition includes a dispersion containing nanoparticles of a sensitizer, which enhances the material's sensitivity to radiation.

Career Highlights

Lu is associated with Isp Investments Inc., where he applies his expertise in developing advanced materials. His work focuses on improving the effectiveness of radiation-sensitive materials, which has important implications in various scientific and industrial applications.

Collaborations

Throughout his career, Guojin Lu has collaborated with esteemed colleagues, including Hsiao-Yi Shih and David F. Lewis. These collaborations have contributed to the advancement of research in the field of radiation sensitivity.

Conclusion

Guojin Lu's innovative work in radiation-sensitive materials exemplifies the impact of his research on technology and industry. His contributions continue to pave the way for advancements in this critical area of study.

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