Guillaume Crinière

Title: The Innovations of Guillaume Crinière

Introduction

Guillaume Crinière is a notable inventor based in Ixelles, Belgium. He has made significant contributions to the field of chemical mechanical polishing through his innovative patent. His work has implications for various industries, particularly in semiconductor manufacturing.

Latest Patents

Guillaume Crinière holds a patent for "Abrasive compositions for chemical mechanical polishing and methods for using same." This patent describes a colloidal dispersion for chemical mechanical polishing that includes an abrasive component and a water-soluble amphoteric polymer. The dispersion is designed to polish substrates comprising silicon nitride and silicon oxide, achieving a reverse selectivity ratio of at least 27, and typically at least 50. This innovation enhances the efficiency and effectiveness of polishing processes in relevant applications.

Career Highlights

Throughout his career, Guillaume has worked with prominent organizations such as Rhodia Operations and Clarkson University. His experience in these institutions has allowed him to develop and refine his expertise in chemical engineering and materials science.

Collaborations

Guillaume has collaborated with notable colleagues, including Suryadevara Vijayakumar Babu and Pradeepa Dandu. These collaborations have contributed to the advancement of his research and innovations in the field.

Conclusion

Guillaume Crinière's contributions to the field of chemical mechanical polishing through his patent and career experiences highlight his role as an influential inventor. His work continues to impact the industry positively.