Sindelfingen-Maichingen, Germany

Guenter Makosch


Average Co-Inventor Count = 1.6

ph-index = 4

Forward Citations = 123(Granted Patents)


Location History:

  • Sindelfingen, DE (1984 - 1988)
  • Sindelfingen-Maichingen, DE (1979 - 1995)

Company Filing History:


Years Active: 1979-1995

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5 patents (USPTO):Explore Patents

Title: Guenter Makosch: Innovator in Phase Measurement Technology

Introduction

Guenter Makosch is a notable inventor based in Sindelfingen-Maichingen, Germany. He has made significant contributions to the field of optical measurement technology, holding a total of 5 patents. His work focuses on innovative methods for phase measurement and alignment in photolithographic systems.

Latest Patents

One of his latest patents is related to interferometric phase measurement. This invention describes a method and apparatus for determining the phase difference between two polarized light beams. Unlike prior techniques, this method allows for simultaneous signal evaluation, enhancing both speed and accuracy. The apparatus utilizes a beam splitter to create several partial beam pairs, which are then focused into a phase shifter, a polarizer, and an array of light sensors. The intensity differences created by the phase differences enable precise height measurements along surfaces.

Another significant patent by Makosch is for interferometric mask-wafer alignment. This invention aims to align a grating on a mask with respect to an equivalent grating on a wafer in photolithographic systems. The process involves focusing symmetrical diffraction orders on the wafer grating and utilizing a beam splitter to direct the output to a photo detector. The intensity of the superimposed beams is dependent on the relative phase differences, allowing for accurate alignment of the mask and wafer gratings.

Career Highlights

Guenter Makosch has had a distinguished career, working at the International Business Machines Corporation (IBM). His expertise in optical measurement technologies has positioned him as a key figure in the development of advanced photolithographic systems.

Collaborations

Throughout his career, Makosch has collaborated with notable colleagues, including Walter Jaerisch and Arno Schmackpfeffer. These collaborations have contributed to the advancement of technologies in their respective fields.

Conclusion

Guenter Makosch's innovative work in phase measurement and alignment technologies has made a lasting impact on the field of optical engineering. His patents reflect a commitment to enhancing measurement accuracy and efficiency in photolithographic systems.

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