Company Filing History:
Years Active: 1989
Title: Guenter Hultsch: Innovator in Photosensitive Compositions
Introduction
Guenter Hultsch is a notable inventor based in Wiesbaden, Germany. His contributions to the field of chemistry, particularly in photosensitive materials, have made a significant impact in various applications. With one patent to his name, Hultsch exemplifies the spirit of innovation.
Latest Patents
Hultsch's patent is titled "Photosensitive composition based on a diazonium salt polycondensation." This invention describes a unique photosensitive composition that includes a diazonium salt polycondensation product coupled with a polymeric binder. The composition is designed to be soluble or at least swellable in aqueous-alkaline solutions. It comprises a reaction product derived from a trimellitic anhydride, where the free carboxyl group is esterified with an alcohol containing a urethane group, combined with a polymer that contains hydroxyl groups without additional functional groups capable of reacting with acid anhydrides. The innovative composition not only provides an increased print run but also ensures excellent storability and developability.
Career Highlights
Guenter Hultsch works for Hoechst Aktiengesellschaft, a prominent corporation known for its contributions to various industries, including pharmaceuticals and chemical products. His involvement in the development of photosensitive compositions reflects his dedication to advancing material science.
Collaborations
Throughout his career, Guenter Hultsch has collaborated with esteemed colleagues, such as Georg Pawlowski and Gerhard Mack. These partnerships have fostered a team-oriented approach to research and development, enhancing the overall innovation process.
Conclusion
In conclusion, Guenter Hultsch stands out as an inventor with a valuable patent that advances the understanding and application of photosensitive compositions. His work at Hoechst Aktiengesellschaft, coupled with his collaborations, has contributed to significant innovations in the field. As technology continues to evolve, Hultsch’s contributions will remain relevant in advancing materials used across various applications.