Elmhurst, NY, United States of America

Guang Liang


Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016-2023

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2 patents (USPTO):Explore Patents

Title: Innovations of Guang Liang in Silicon Compound Monitoring

Introduction

Guang Liang is an accomplished inventor based in Elmhurst, NY (US). He has made significant contributions to the field of silicon compound monitoring, holding two patents that showcase his innovative approaches. His work is particularly relevant in the context of etchant solutions, which are critical in various industrial applications.

Latest Patents

Guang Liang's latest patents include methods and apparatuses for selective monitoring of multiple silicon compounds in etchant solutions. These methods involve reacting a test solution containing various silicon compounds with a fluoride-based compound under different conditions to establish silicon:reagent binding ratios. One innovative aspect of his work is the addition of a co-solvent to the test solution, which enhances the accuracy of concentration determinations. Additionally, he has developed a method for analyzing silicon ions in alkaline etchant solutions. This involves acidifying a sample of the etchant solution, adding fluoride ions, and utilizing a fluoride ion specific electrode (FISE) to detect free fluoride ions, ensuring high sensitivity and precision.

Career Highlights

Guang Liang is currently employed at Eci Technology, Inc., where he continues to advance his research and development efforts. His expertise in silicon compounds has positioned him as a key figure in the industry, contributing to the development of more effective monitoring techniques.

Collaborations

Guang Liang collaborates with notable colleagues such as Eugene Shalyt and Peter Bratin. Their combined expertise fosters an environment of innovation and progress within their field.

Conclusion

Guang Liang's contributions to the monitoring of silicon compounds through his patents reflect his dedication to innovation in the field. His work not only enhances the understanding of silicon compounds but also improves industrial processes.

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