Company Filing History:
Years Active: 2003
Title: Innovations in Semiconductor Substrates: The Contributions of Gregory D. Pomarico
Introduction
Gregory D. Pomarico, an accomplished inventor based in Beacon, NY, has made significant strides in the field of semiconductor technology. With one patent to his name, Pomarico’s work demonstrates his innovative approach to enhancing surface morphology in semiconductor substrates, particularly through the use of SIMOX (Separation by IMplantation of OXygen) techniques. His contributions are poised to impact the future of semiconductor manufacturing and processing.
Latest Patents
Pomarico's patent titled "Surface roughness improvement of SIMOX substrates by controlling orientation of angle of starting material" presents a groundbreaking method for improving semiconductor substrates. The process involves providing a silicon ingot positioned on a support member and orientating it relative to a cutting device. By cutting the silicon ingot along about a (100) crystal plane using a wire saw, he achieved a substrate with a miscut angle of less than approximately 0.15 degrees. This precision is essential for the successful implantation of oxygen atoms that form a buried oxide layer in the silicon substrate, followed by careful annealing. The patent emphasizes that the final substrate surface should measure between 2-20 Å RMS, as determined using atomic force microscopy, showcasing the meticulous nature of Pomarico’s methods.
Career Highlights
Gregory D. Pomarico is associated with the renowned International Business Machines Corporation (IBM), a leader in technological innovation and research. His tenure at IBM has provided him with valuable experience and a platform to develop cutting-edge technologies in semiconductor research and manufacturing. His work not only contributes to the advancements in semiconductor technology but also underscores the collaborative nature of innovation within large organizations.
Collaborations
Throughout his career, Pomarico has worked alongside esteemed colleagues, including Anthony Gene Domenicucci and Neena Garg. These collaborations highlight the importance of teamwork in research and development, as they blend various expertise and perspectives to drive innovative solutions in technology.
Conclusion
Gregory D. Pomarico's innovative methods in enhancing the surface morphology of semiconductor substrates are noteworthy in the realm of technological advancements. His patent reflects a crucial step towards improving manufacturing processes in the semiconductor industry. As innovations continue to emerge, the impact of inventors like Pomarico will undoubtedly contribute to the evolution of technology, ensuring improved performance and capabilities in future semiconductor applications.
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