Yorktown Heights, NY, United States of America

Gottlieb S Oehrlein


Average Co-Inventor Count = 3.1

ph-index = 8

Forward Citations = 308(Granted Patents)


Company Filing History:


Years Active: 1992-1998

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9 patents (USPTO):Explore Patents

Title: Innovations by Gottlieb S. Oehrlein: A Vanguard in Semiconductor Technology

Introduction

Gottlieb S. Oehrlein, based in Yorktown Heights, NY, is an esteemed inventor known for his significant contributions to the field of semiconductor technology. With a remarkable portfolio of nine patents, he continues to influence advancements in etching processes critical for semiconductor devices.

Latest Patents

Among his latest innovations, Oehrlein has developed an apparatus for hot wall reactive ion etching employing a dielectric. This groundbreaking invention addresses the challenge of film deposition on internal surfaces of etching apparatuses, thereby ensuring a cleaner etching process. His system features an etching chamber with a deposition-resistant surface, a holder for the device being etched, and a controlled heating element that maintains the surface temperature between 100°C to 600°C. This precise temperature regulation impedes film formation on the chamber walls and enhances the efficiency of the etching process.

Additionally, Oehrlein has made strides in improving the adhesion of fluorocarbon films to substrates. This innovation involves creating a non-volatile carbide-forming metallic layer between the substrate and the fluorocarbon film. By exposing the substrate to ion bombardment in a noble gas/polymerizing gas atmosphere prior to film application, he enhances the adhesion properties, significantly optimizing the application in semiconductor manufacturing.

Career Highlights

Gottlieb Oehrlein is currently associated with the International Business Machines Corporation (IBM), a global leader in technology and innovation. His tenure at IBM underscores his commitment to pushing the boundaries of semiconductor technologies. Through his research and development efforts, Oehrlein has positioned himself as a key figure in evolving the industry's standards for etching processes and materials.

Collaborations

In his pursuit of innovation, Oehrlein has collaborated with notable co-inventors, including Thao Ngoc Nguyen and Zeev A. Weinberg. Their teamwork exemplifies the collaborative spirit needed to tackle complex challenges in semiconductor technology, combining their expertise to create advanced solutions that benefit the entire industry.

Conclusion

Gottlieb S. Oehrlein's contributions to semiconductor technology through his innovative patents continue to shape the future of the industry. As he works on enhancing etching processes and material applications, his work at IBM serves as a testament to his dedication and vision. Oehrlein’s inventive spirit inspires both current and future generations of engineers and inventors, reinforcing the vital role of innovation in technology.

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