Company Filing History:
Years Active: 1988-1989
Title: Glen E Howard: Innovator in Electron Beam Lithography
Introduction
Glen E Howard is a notable inventor based in Pleasanton, CA (US), recognized for his contributions to the field of electron beam lithography. He holds 2 patents that showcase his innovative approach to enhancing the efficiency and effectiveness of lithography systems.
Latest Patents
One of Howard's latest patents is the "Guard ring for a differentially pumped seal apparatus." This invention involves a guard ring in a particle beam lithography system that surrounds a seal apparatus with a pressurized gas. The guard ring serves to reduce contamination of the seal apparatus and beam column by forming a curtain of gas that protects against ambient pressure. The patent describes various embodiments, including a ring of small ports connected to a source of pressurized gas and a groove that distributes the emitted gas.
Another significant patent is the "Specimen distance measuring system." This system utilizes a shadow plate to obstruct backscattered electrons produced by an electron beam, casting a shadow across a measurement detector. This innovative design allows for precise calibration of the distance measuring system, making it particularly useful as a height sensor in electron beam lithography apparatus. The system also includes a reference detector to compensate for variations in electron beam current and substrate backscatter coefficient.
Career Highlights
Glen E Howard is associated with The Perkin-Elmer Corporation, where he has made significant contributions to the development of advanced lithography technologies. His work has been instrumental in improving the precision and reliability of electron beam lithography systems.
Collaborations
Howard has collaborated with notable colleagues, including Lydia J Young and William A Eckes, contributing to a dynamic and innovative work environment.
Conclusion
Glen E Howard's innovative patents and contributions to electron beam lithography highlight his role as a key figure in advancing technology in this field. His work continues to influence the development of more efficient lithography systems.