Turin, Italy

Giuseppe Inghilterra


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Giuseppe Inghilterra: Innovator in Exhaust Gas Treatment Technology

Introduction

Giuseppe Inghilterra is a notable inventor based in Turin, Italy. He has made significant contributions to the field of exhaust gas treatment technology. His innovative approach has led to the development of a unique patent that addresses critical issues in this area.

Latest Patents

Giuseppe holds a patent for an "Interconnection system of a urea-based reducing agent injector to an after-treatment exhaust gas device." This system is designed to interconnect a urea-based reducing agent injector to an exhaust gas post-treatment device. The invention includes an injector, a flange that couples the injector to an exhaust gas line, and a gasket positioned between the injector and the flange. Notably, the gasket is a sandwich structure, consisting of two external layers and an intermediate layer made from insulating material. This innovative design enhances the efficiency and effectiveness of exhaust gas treatment systems.

Career Highlights

Giuseppe Inghilterra is currently employed at FPT Industrial S.p.A., where he continues to develop and refine technologies related to exhaust gas treatment. His work at the company has positioned him as a key player in the industry, contributing to advancements that align with environmental standards and regulations.

Collaborations

Throughout his career, Giuseppe has collaborated with talented individuals such as Marco Federico Pidria and Luca Vargiu. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Giuseppe Inghilterra's contributions to exhaust gas treatment technology exemplify the impact of innovative thinking in addressing environmental challenges. His patent and ongoing work at FPT Industrial S.p.A. highlight his commitment to advancing this critical field.

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