Gisela Renz

Title: Gisela Renz: Innovator in Selective Metal Deposition

Introduction

Gisela Renz is a notable inventor based in Grafenau, Germany. She has made significant contributions to the field of materials science, particularly in the area of selective metal deposition. Her innovative approach has implications for various applications in electronics and semiconductor manufacturing.

Latest Patents

Gisela Renz holds a patent for a "Method and apparatus for the selective, self-aligned deposition of metal." This invention involves a method and apparatus designed for the selective deposition of metal layers on a substrate. The process allows for at least one metal layer to be deposited in a self-aligned manner on conductive regions of isolating or semiconductive substrates. The conductive regions are positioned facing a metal plate, which has at least one layer of the metal to be deposited. Tesla currents are generated between the metal plate and the regions to be coated, enhancing the efficiency of the deposition process.

Career Highlights

Gisela Renz is associated with International Business Machines Corporation (IBM), where she has been instrumental in advancing technologies related to metal deposition. Her work has contributed to the development of conductors on or within ceramic modules, circuit cards, and semiconductor elements.

Collaborations

Throughout her career, Gisela has collaborated with notable colleagues, including Thomas Bayer and Georg Kraus. These partnerships have fostered innovation and have led to advancements in their respective fields.

Conclusion

Gisela Renz's contributions to the field of selective metal deposition exemplify her innovative spirit and dedication to advancing technology. Her patent and work at IBM highlight her role as a leading inventor in the industry.