Company Filing History:
Years Active: 2012-2015
Title: Giovanni Nocerino: Innovator in EUV Lithography Technology
Introduction
Giovanni Nocerino is a prominent inventor based in Pleasanton, CA (US). He has made significant contributions to the field of extreme ultraviolet (EUV) lithography, holding a total of 5 patents. His work focuses on developing advanced technologies that enhance the efficiency and effectiveness of lithography systems.
Latest Patents
Nocerino's latest patents include innovative designs for source-collector modules that utilize grazing-incidence collector (GIC) mirrors. One of his notable inventions is a source-collector module with a GIC mirror and a laser-produced plasma (LPP) EUV light source. This module is designed for an EUV lithography system, incorporating a laser-produced plasma that generates EUV radiation. The GIC mirror is strategically arranged to receive and focus the EUV radiation, improving far-field imaging performance through a polynomial surface-figure correction.
Another significant patent is the source-collector module with a GIC mirror and a tin vapor LPP target system. This invention aims to generate a laser-produced plasma that emits EUV radiation, utilizing a light source portion and a target portion. The GIC mirror in this design also focuses the EUV radiation, enhancing the overall efficiency of the lithography system.
Career Highlights
Giovanni Nocerino has established himself as a key figure in the field of EUV lithography through his innovative patents and contributions to technology. His work at Media Lario S.r.l. has positioned him at the forefront of advancements in lithography systems, making significant strides in the development of efficient radiation collection methods.
Collaborations
Nocerino has collaborated with notable colleagues, including Natale Ceglio and Fabio E Zocchi. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of lithography technology.
Conclusion
Giovanni Nocerino's contributions to EUV lithography technology through his patents and collaborative efforts highlight his role as an influential inventor. His work continues to shape the future of lithography systems, paving the way for advancements in the industry.
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