Gianluca Cividini

Title: Gianluca Cividini: Innovator in Silicon Carbide Deposition

Introduction

Gianluca Cividini is a notable inventor based in Baranzate, Italy. He has made significant contributions to the field of materials science, particularly in the deposition of silicon carbide. His innovative methods have the potential to advance various applications in electronics and semiconductor technology.

Latest Patents

Cividini holds a patent for a "Method for CVD deposition of n-type doped silicon carbide and epitaxial reactor." This method involves depositing a layer of silicon carbide with n-type doping onto a substrate using a chemical vapor deposition (CVD) process. The process utilizes a rotating susceptor that supports a single substrate within a reaction chamber. The gaseous mixture introduced into the chamber contains precursors for silicon carbide and a dopant substance that undergoes pyrolysis, resulting in the formation of specific chemical species. The method operates at high temperatures and controlled pressures, optimizing the deposition process.

Career Highlights

Gianluca Cividini is associated with LPE S.p.A., a company known for its expertise in advanced materials and semiconductor technologies. His work at LPE S.p.A. has allowed him to focus on innovative solutions in the field of silicon carbide deposition.

Collaborations

Cividini collaborates with Silvio Preti, contributing to advancements in their shared field of expertise. Their partnership enhances the research and development efforts at LPE S.p.A.

Conclusion

Gianluca Cividini's contributions to the field of silicon carbide deposition exemplify the importance of innovation in materials science. His patented methods pave the way for future advancements in semiconductor technology.