Company Filing History:
Years Active: 2008-2009
Title: **Inventor Spotlight: Gi-sung Yoon**
Introduction
Gi-sung Yoon, based in Suwon-si, South Korea, is a notable inventor recognized for his contributions to the field of photomask technology. With two registered patents to his name, Yoon has significantly impacted the photolithography processes used in various advanced manufacturing applications.
Latest Patents
Yoon's latest innovations include a groundbreaking method of manufacturing a rim type of photomask and a photo mask capable of improving resolution by utilizing the polarization of light. The first patent outlines a method that prevents irregularities in the chrome pattern formed in the 0°-phase shift region of the mask substrate, ensuring a uniform width at the border. This innovative approach involves etching a light blocking layer on a quartz substrate and forming a 180°-phase shift region through precise etching. Subsequently, a fluid material layer is applied to enhance the patterning process by utilizing it as a mask during etching.
His second patent enhances the resolution of photolithography processes through a unique photo mask that includes a transparent quartz substrate combined with reflection and light-blocking patterns, ultimately enriching the quality of the imaging process during manufacturing.
Career Highlights
Gi-sung Yoon is currently associated with Samsung Electronics Co., Ltd., where he continues to apply his expertise in developing cutting-edge photomask technologies. His inventive prowess is reflected in the patents he holds, showcasing his commitment to innovation in the semiconductor industry.
Collaborations
Working alongside notable colleagues such as Sung-hyuck Kim and In-kyun Shin, Yoon has fostered a collaborative environment that encourages innovation and problem-solving within his projects. Their combined efforts underscore the spirit of teamwork in advancing technologies in photomask manufacturing.
Conclusion
Through his patents and collaborative projects, Gi-sung Yoon exemplifies the innovative spirit of modern inventors. His work not only addresses current challenges in photolithography but also sets the foundation for future advancements in the semiconductor industry.