Gi-Hyun Hwang

Title: Gi-Hyun Hwang: Innovator in Semiconductor Manufacturing

Introduction

Gi-Hyun Hwang is a prominent inventor based in Yongin, South Korea. He is known for his contributions to the field of semiconductor manufacturing. His innovative methods have significantly impacted the efficiency and quality of semiconductor devices.

Latest Patents

Gi-Hyun Hwang holds a patent for a "Method of manufacturing a semiconductor device including alignment mark." This patent describes a method aimed at inhibiting pit occurrence on a semiconductor substrate during the manufacturing process. The process involves forming an isolation using a shallow trench isolation (STI) method, implanting ions into the substrate, and utilizing a rapid thermal annealing (RTA) process. The method also includes forming a photoresist layer and creating an align key through etching, which enhances the manufacturing precision of semiconductor devices. He has 1 patent to his name.

Career Highlights

Hwang is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation. His expertise in manufacturing processes has contributed to the advancement of semiconductor technology.

Collaborations

Throughout his career, Gi-Hyun Hwang has collaborated with notable colleagues, including Kong-Soo Lee and Young-wook Park. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Gi-Hyun Hwang is a key figure in the semiconductor industry, with a focus on improving manufacturing methods. His contributions continue to shape the future of semiconductor technology.