Burghausen, Germany

Gertraud Thalhammer


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Gertraud Thalhammer: Innovator in Semiconductor Cleaning Solutions

Introduction

Gertraud Thalhammer is a notable inventor based in Burghausen, Germany. She has made significant contributions to the field of semiconductor technology, particularly in the development of cleaning agents for semiconductor wafers. Her innovative approach has led to the creation of a patented cleaning method that enhances the efficiency of semiconductor manufacturing processes.

Latest Patents

Thalhammer holds a patent for a cleaning agent and method specifically designed for cleaning semiconductor wafers. The patent describes an aqueous cleaning agent with a pH range of 1 to 5, preferably between 1 and 3. This cleaning agent contains at least one surfactant and a compound from a group that includes succinic acid and its derivatives. The method involves generating a thin film of the cleaning agent on the side faces of the semiconductor wafers, ideally using a mechanical tool. This innovative solution addresses the critical need for effective cleaning in semiconductor production.

Career Highlights

Throughout her career, Gertraud Thalhammer has been associated with Wacker Siltronic, a leading company in the semiconductor materials industry. Her work has focused on improving cleaning processes, which are essential for maintaining the quality and performance of semiconductor devices. Thalhammer's dedication to innovation has positioned her as a key figure in her field.

Collaborations

Thalhammer has collaborated with several professionals in her field, including her coworkers Roland Brunner and Georg Hochgesang. These collaborations have contributed to the advancement of cleaning technologies in semiconductor manufacturing.

Conclusion

Gertraud Thalhammer's contributions to the semiconductor industry through her innovative cleaning agent and method exemplify her commitment to enhancing manufacturing processes. Her work continues to influence the field, ensuring the production of high-quality semiconductor devices.

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