Dresden, Germany

Gerrit Mäder

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2009

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Gerrit Mäder: Innovator in Optical Detection Technologies

Introduction

Gerrit Mäder is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of optical detection, particularly in the context of chemical processes. His innovative work has led to the development of a unique device and method for detecting substances in waste gases.

Latest Patents

Gerrit Mäder holds a patent for a "Device and method for optical detecting substances contained in waste gases of chemical processes." This invention involves a device that allows for the optical detection of substances in exhaust gases. The design includes a channel element that forms an optical measuring section, with flanges that are sealed off from the ambient area. The device utilizes a window element to direct electromagnetic radiation from a source to an optical detector, facilitating accurate detection of substances in waste gases. The invention also incorporates a purge gas system to maintain a closed laminar flow within the channel element.

Career Highlights

Gerrit Mäder is associated with the Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung E.V., a leading research organization in applied sciences. His work at this institution has allowed him to focus on innovative solutions that address real-world challenges in chemical processes and environmental monitoring.

Collaborations

Gerrit has collaborated with esteemed colleagues such as Ines Dani and Wulf Grählert. These partnerships have fostered a collaborative environment that enhances the development of cutting-edge technologies in their field.

Conclusion

Gerrit Mäder's contributions to optical detection technologies exemplify the impact of innovative thinking in addressing environmental challenges. His patent and ongoing work continue to influence the field of chemical process monitoring.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…