Gerard P Quigley

Title: Gerard P. Quigley: Innovator in Vacuum Ultraviolet Light Sources

Introduction

Gerard P. Quigley is a notable inventor based in Los Alamos, NM (US). He has made significant contributions to the field of light sources, particularly in the development of contamination-free vacuum ultraviolet (VUV) light sources. His work is essential for advancements in semiconductor and flat panel display material processing.

Latest Patents

Quigley holds a patent for a "Large area, surface discharge pumped, vacuum ultraviolet light source." This innovative light source features a 225 cm² emission area within the 240-340 nm region of the electromagnetic spectrum. It boasts an average output power of about 2 J/cm² at a wall-plug efficiency of approximately 5%. The design employs only ceramics and metal parts, ensuring a contamination-free operation. The high photon energy and flux, along with short pulse characteristics, make this source particularly suitable for various industrial applications.

Career Highlights

Gerard P. Quigley is affiliated with the University of California, where he continues to contribute to research and development in his field. His expertise in VUV light sources has positioned him as a key figure in advancing technologies that rely on high-energy light for material processing.

Collaborations

Quigley has collaborated with Robert C. Sze, further enhancing the impact of his work in the field of light sources. Their joint efforts have contributed to the development of innovative technologies that push the boundaries of current capabilities.

Conclusion

Gerard P. Quigley's contributions to the field of vacuum ultraviolet light sources exemplify the importance of innovation in technology. His work not only advances scientific understanding but also has practical applications in various industries.