Gerard Henrion

Title: Gerard Henrion: Innovator in Self-Stabilizing Deposition Technology

Introduction

Gerard Henrion is a notable inventor based in Champigneulles, US. He has made significant contributions to the field of materials science, particularly in the area of self-stabilizing deposition methods. His innovative approach has led to advancements in the way stoichiometric compounds are deposited using reactive sputtering techniques.

Latest Patents

Henrion holds a patent for a "Method for self-stabilizing deposition of a stoichiometric compound by reactive sputtering using a cold plasma." This method involves supplying a reactive gas to a target while cyclically adjusting the instantaneous power applied to the target. The frequency of these adjustments is low enough to facilitate a reaction between the target material and the reactive gas on the target's surface. The resulting product is then sputtered onto a substrate, allowing for self-stabilizing deposition of the reaction product.

Career Highlights

Gerard Henrion is affiliated with the Institut National Polytechnique de Lorraine, where he has been instrumental in advancing research in his field. His work has garnered attention for its innovative approach to deposition techniques, which are crucial for various applications in materials science and engineering.

Collaborations

Henrion has collaborated with notable colleagues, including Bruno Stauder and Frederic Perry. These partnerships have contributed to the development and refinement of his patented technologies.

Conclusion

Gerard Henrion's contributions to the field of self-stabilizing deposition technology highlight his role as an influential inventor. His innovative methods continue to impact the materials science landscape, paving the way for future advancements.