Company Filing History:
Years Active: 1998-2001
Title: The Innovations of Gerald Girard: Pioneering Electrostatic Techniques for Semiconductor Processing
Introduction: Gerald Girard, a notable inventor based in Milpitas, California, has made significant contributions to the field of semiconductor technology. With two patents to his name, Girard's work focuses on innovative methods to enhance the efficiency and cleanliness of semiconductor processing equipment, ensuring that these vital components remain free of contaminants during fabrication.
Latest Patents: Gerald Girard's most recent patents showcase an ingenious electrostatic technique designed for the removal of particulates from semiconductor substrates, particularly within plasma processing chambers like plasma-enhanced chemical vapor deposition (PECVD) chambers. The first patented method involves temporarily isolating a normally grounded electrode that supports the wafer and connecting it to a bias voltage generator. This generator supplies a bias voltage that electrostatically launches particulates from the wafer's surface. Meanwhile, a plasma is maintained above the grounded electrode, allowing the launched particulates to become suspended within a surrounding sheath region. This innovative method ensures comprehensive particle removal, as the bias voltage alternates in polarity to target both positively and negatively charged particles.
Career Highlights: Throughout his career, Girard has been associated with Applied Materials, Inc., a renowned leader in semiconductor manufacturing technology. His expertise in plasma processing and particle removal systems highlights his commitment to advancing the industry and ensuring the reliability of semiconductor devices.
Collaborations: In his professional journey, Gerald Girard has had the opportunity to collaborate with esteemed colleagues such as Charles N Dornfest and Anand Gupta. These collaborations have enabled him to further enhance his inventions and contribute to groundbreaking advancements in semiconductor technology.
Conclusion: Gerald Girard's innovative approaches to particulate removal in semiconductor processing chambers exemplify his dedication to improving technology for the semiconductor industry. With his patents and collaborative spirit, Girard continues to pave the way for cleaner and more efficient manufacturing processes, solidifying his place as an influential inventor in the field.