Company Filing History:
Years Active: 2019
Title: The Innovations of Gerald Daniel
Introduction
Gerald Daniel is a notable inventor based in Essingen, Germany. He has made significant contributions to the field of chemical engineering, particularly in the area of chemical mechanical polishing (CMP) compositions. His work has implications for various industries, including semiconductor manufacturing.
Latest Patents
Gerald Daniel holds a patent for a chemical mechanical polishing (CMP) composition designed for the effective polishing of substrates comprising germanium. The patent discloses a composition that includes inorganic particles, a specific compound, and an aqueous medium, with a pH ranging from 2 to 6. This innovation is crucial for enhancing the efficiency of polishing processes in various applications.
Career Highlights
Gerald Daniel is currently employed at BASF SE Corporation, a leading global chemical company. His role involves research and development in innovative chemical processes. His expertise in CMP compositions has positioned him as a key figure in advancing polishing technologies.
Collaborations
Gerald has collaborated with talented coworkers, including Max Siebert and Michael Lauter. Their combined efforts contribute to the ongoing development of innovative solutions in the field of chemical engineering.
Conclusion
Gerald Daniel's contributions to the field of chemical mechanical polishing highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and pave the way for future advancements.