George W Dugdale

Title: George W. Dugdale: Innovator in X-ray Lithography

Introduction

George W. Dugdale is a notable inventor based in West Redding, Connecticut. He has made significant contributions to the field of X-ray lithography, particularly through his innovative methods aimed at improving beamline uniformity. His work is essential for advancing technologies that rely on precise X-ray applications.

Latest Patents

Dugdale holds a patent for a method of improving an X-ray lithography beamline uniformity. This patent outlines a sophisticated approach for calibrating a beamline used in X-ray lithography. The method involves an elongated evacuated tube that extends from an X-ray source to a closure with a beryllium window. A target wafer, coated with a uniform layer of light-sensitive material, is positioned in a plane transverse to the X-ray beamline. The invention includes a carbon filter that blocks unwanted electromagnetic radiation, ensuring that the X-ray beam is accurately directed onto the target wafer. This process ultimately allows for the formation of a contoured surface that compensates for non-uniformities in the beamline components.

Career Highlights

George W. Dugdale is associated with Hughes Danbury Optical Systems, Inc., where he has applied his expertise in optical systems and X-ray technologies. His work has been instrumental in enhancing the performance and reliability of X-ray lithography systems.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

George W. Dugdale's contributions to X-ray lithography through his innovative patent demonstrate his commitment to advancing technology in this field. His work continues to influence the development of precise optical systems.