Company Filing History:
Years Active: 1988-1992
Title: **George J. Giuffre: Innovating Electron Beam Lithography**
Introduction
George J. Giuffre, an accomplished inventor based in Wappingers Falls, NY, has made significant contributions to the field of electron beam lithography. With a total of three patents to his name, Giuffre has focused on developing methods that improve accuracy and efficiency in calibration grids utilized in various technological applications.
Latest Patents
Giuffre's latest patents include groundbreaking methods for forming planarized, reusable calibration grids. These innovations have led to the development of improved structures for electron beam lithography grids, allowing grid lines to be coplanar with the grid body surface. The unique design incorporates grooves that provide lateral support for the grid lines, ensuring they can be cleaned effectively after exposure to contamination from outgassing resist during use. This advancement not only enhances the accuracy of electron beam lithography processes but also enables these processes to be conducted with greater speed and lower costs. Additionally, the improved calibration grid facilitates the flexible design and manufacturing of integrated circuits and masks, contributing to better integration densities and manufacturing yields.
Career Highlights
George J. Giuffre is currently associated with International Business Machines Corporation (IBM), where he contributes his expertise in developing advanced technologies for precision manufacturing processes. His work continues to influence the trajectory of innovation in the electronics industry, particularly in the realm of lithography.
Collaborations
Throughout his career, Giuffre has collaborated with notable colleagues including Maris A. Sturans and James F. White. These partnerships have enriched his work and fostered an environment of creativity and innovation within the projects they have undertaken together.
Conclusion
In conclusion, George J. Giuffre stands out as a key figure in the world of technology, particularly in the field of electron beam lithography. His three patents reflect his commitment to enhancing the accuracy and efficiency of manufacturing processes. With ongoing innovations and collaborations, Giuffre continues to shape the future of integrated circuit design and production.