Company Filing History:
Years Active: 2009
Title: Georg Aigeldinger: Innovator in X-ray Lithography
Introduction
Georg Aigeldinger is a notable inventor based in Livermore, California. He has made significant contributions to the field of X-ray lithography through his innovative work. His expertise and inventions have had a lasting impact on the industry.
Latest Patents
Georg Aigeldinger holds a patent for a "Vitreous carbon mask substrate for X-ray lithography." This invention focuses on utilizing vitreous carbon as a substrate material for creating masks used in X-ray lithography. The new substrate allows for a reduced thickness of the mask absorber, which enhances mask accuracy. An alternative embodiment of his invention involves using vitreous carbon as a LIGA substrate, where the VC wafer blank is etched in a reactive ion plasma, followed by bonding an X-ray resist. This surface treatment ensures good adhesion of the X-ray photoresist and facilitates the nucleation and adhesion of electrodeposited metal for LIGA mold-making. Additionally, the VC substrate minimizes secondary radiation effects that can lead to delamination of the X-ray resist from the substrate.
Career Highlights
Georg Aigeldinger is associated with Sandia Corporation, where he has contributed to various projects and innovations. His work has been instrumental in advancing technologies related to X-ray lithography.
Collaborations
Throughout his career, Georg has collaborated with notable colleagues, including Dawn M Skala and Stewart K Griffiths. These collaborations have further enriched his work and contributions to the field.
Conclusion
Georg Aigeldinger is a distinguished inventor whose work in X-ray lithography has paved the way for advancements in the industry. His innovative patent and collaborations highlight his commitment to enhancing technology in this specialized field.