Gentaro Nagamatsu

Title: The Innovative Contributions of Gentaro Nagamatsu

Introduction

Gentaro Nagamatsu is a prominent inventor based in Tokyo, Japan, known for his innovative contributions to the field of lithography and resist materials. With a total of three patents to his name, Nagamatsu has made significant strides in enhancing the efficiency and effectiveness of printing processes.

Latest Patents

Gentaro Nagamatsu's latest patents showcase his expertise in advanced materials and processes. One of his notable inventions is a "Method of preparing a lithographic printing plate." This method involves using a toner image formed by an electrophotographic process, which is then transferred and fixed onto a metal base lithographic printing plate featuring a thin insulating synthetic resin surface layer. After transferring, the synthetic resin layer on the non-image area is removed, followed by the removal of toner, leaving behind well-defined resin image areas.

Additionally, he developed a "Positive resist for high energy radiation," which serves as a resist material to create a positive image through radiation application. This material primarily consists of poly(ethyl α-cyanoacrylate), poly(ethyl α-amidoacrylate), or their binary and ternary copolymers. Notably, the minimum incident charge of radiation required to form a desired resist pattern using this material is as low as 10.sup.-7 coulomb/cm.sup.2, marking a significant improvement over traditional resist materials. The positive resist image produced is durable enough to withstand chromium etching solutions even with short irradiation times.

Career Highlights

Throughout his career, Gentaro Nagamatsu has collaborated with renowned companies, including Fuji Chemicals Industrial Co., Ltd. and Matsushita Electric Industrial Co., Ltd. His work has contributed to the advancement of materials used in printing technologies, demonstrating his commitment to innovation and excellence.

Collaborations

In his journey as an inventor, Nagamatsu has worked alongside notable colleagues such as Shunsuke Matsuda and Soji Tsuchiya. These collaborations have fostered an environment of shared ideas and innovations, further enhancing the quality and impact of their work in the field.

Conclusion

Gentaro Nagamatsu's contributions to the field of lithography and resist materials underscore his role as an influential inventor. With a focus on improving the efficiency and effectiveness of printing processes, his innovations continue to shape advancements in technology. As he continues his work, Nagamatsu remains a significant figure in the world of inventions and patents.