Muncie, IN, United States of America

Gene O Fanger


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1980

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Gene O. Fanger

Introduction

Gene O. Fanger, based in Muncie, Indiana, is a notable inventor recognized for his contribution to the field of photopolymerization. With a keen interest in enhancing printing technologies, Fanger has been credited with a unique patent that addresses the challenges faced in photolithography and other photomechanical processes.

Latest Patents

Fanger holds a patent for a "Photopolymerizable composition with oxalic acid photoinitiator." This innovative composition consists of an aqueous mixture comprising a water-insoluble resin, water-soluble binder, a crosslinking agent, and a photopolymerization initiator featuring an alpha-keto ester linkage. The inclusion of oxalic acid and its derivatives, such as sodium oxalate and potassium oxalate, provides significant advantages. The resulting printing plates exhibit enhanced ink receptivity and durability, ensuring excellent performance even after prolonged use.

Career Highlights

Gene O. Fanger is employed at Ball Corporation, where his expertise in innovative materials has contributed to advancements in printing elements. His work has not only improved the quality of printing processes but has also positioned the company as a leader in this specialized field.

Collaborations

Throughout his career, Fanger has collaborated with fellow inventor George W. Brutchen. Together, they have explored various avenues in the realm of polymerization and printing, leading to significant breakthroughs that have benefited their industry.

Conclusion

Gene O. Fanger's contributions to the world of photopolymerization and printing technologies showcase the impact of innovative thinking in solving real-world problems. His inventive spirit continues to inspire advancements within Ball Corporation and the broader realm of photomechanical processes.

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