Company Filing History:
Years Active: 1993-1997
Title: Gen Sudo: Innovator in Solid-State Imaging and Etching Technologies
Introduction
Gen Sudo is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the fields of solid-state imaging and substrate etching. With a total of 5 patents to his name, Sudo continues to push the boundaries of technology through his innovative ideas.
Latest Patents
One of his latest patents is focused on dark current suppression for solid-state image sensing devices. This invention involves a solid-state image sensing device that features multiple pixels, each outputting a signal charge corresponding to the amount of light projected onto them. The device includes a photo-diode, a storage portion for charge storage, a transfer portion for charge transfer, and a control portion that regulates the charge received based on the dark current characteristics of the photo-diode.
Another notable patent is a method for etching HgCdTe substrates. This method allows for selective dry etching of the substrate without causing damage. The process is designed to achieve higher selectivity of the HgCdTe substrate versus a resist mask, making the removal of the resist mask after etching straightforward. The etching gas used contains nitrogen and hydrogen molecules, which are formed into plasma to facilitate the etching process.
Career Highlights
Gen Sudo is currently employed at Fujitsu Corporation, where he applies his expertise in developing advanced technologies. His work has significantly impacted the field of imaging and materials processing, showcasing his ability to innovate and solve complex engineering challenges.
Collaborations
Throughout his career, Sudo has collaborated with notable colleagues, including Kenji Arinaga and Koji Fujiwara. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Gen Sudo's contributions to solid-state imaging and substrate etching exemplify his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving the efficiency and effectiveness of imaging devices and materials processing techniques.