Hiki-gun, Japan

Gen Itokawa


Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2009-2010

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2 patents (USPTO):Explore Patents

Title: Gen Itokawa: Innovator in Photosensitive Resin Technology

Introduction

Gen Itokawa is a notable inventor based in Hiki-gun, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 2 patents. His work focuses on developing innovative materials that enhance photolithography processes.

Latest Patents

Itokawa's latest patents include an alkali-developable black photosensitive resin composition designed for forming light-shielding barrier walls. This composition consists of essential components such as a carboxyl group-containing photosensitive prepolymer, a photopolymerization initiator, a black pigment, and light-transmitting fine particles. The formulation allows for the creation of light-shielding barrier walls with a height of at least 20 micrometers, ensuring sufficient light-shielding properties without undercutting during development. Another significant patent is a photocurable and thermosetting resin composition that includes a carboxylic acid-containing photosensitive resin, a filler, a photopolymerization initiator, a diluent, and a compound with cyclic ether groups. This composition can be developed using a diluted alkali solution and is suitable for pattern formation using a laser oscillation light source.

Career Highlights

Throughout his career, Gen Itokawa has worked with prominent companies such as Taiyo Ink Mfg. Co., Ltd. and Nippon Sheet Glass Company, Limited. His experience in these organizations has contributed to his expertise in resin technology and photolithography.

Collaborations

Itokawa has collaborated with notable colleagues, including Kenji Kato and Hidekazu Miyabe. Their joint efforts have further advanced the development of innovative materials in the field.

Conclusion

Gen Itokawa's contributions to photosensitive resin technology and his innovative patents highlight his role as a significant inventor in this field. His work continues to influence advancements in photolithography and material science.

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