Company Filing History:
Years Active: 2001-2004
Title: Geetha Surendran: Innovator in Photoresist Stripping Technologies
Introduction
Geetha Surendran is a notable inventor based in the Bronx, NY. She has made significant contributions to the field of photoresist stripping technologies, holding two patents that focus on reducing metal corrosion during the stripping process. Her work is essential for improving the efficiency and safety of various industrial applications.
Latest Patents
Geetha's latest patents include innovative alkaline photoresist stripping compositions that contain reducing agents to mitigate metal corrosion. These compositions utilize a variety of reducing agents, such as compounds with reactive multiple bonds, hydrazine and its derivatives, oximes, hydroquinone, pyrogallol, gallic acid and its esters, tocopherol, and several others. The formulations aim to enhance the effectiveness of photoresist strippers while ensuring the integrity of the underlying metal surfaces.
Career Highlights
Geetha Surendran is currently employed at Mallinckrodt Baker, Inc., where she continues to develop and refine her innovative technologies. Her expertise in chemical engineering and materials science has positioned her as a leader in her field.
Collaborations
Geetha has collaborated with her coworker, George Schwartzkopf, to advance their research and development efforts. Together, they have worked on various projects that aim to improve the performance of photoresist stripping processes.
Conclusion
Geetha Surendran's contributions to the field of photoresist stripping technologies highlight her innovative spirit and dedication to advancing industrial processes. Her patents reflect a commitment to enhancing safety and efficiency in manufacturing.