Essen, Germany

Gebhard Tomalla

This inventor holds 5 USPTO granted patents and 2 published patent applications and 1 EPO patent. Top assignees: Fried. Krupp Gesellschaft MIT Beschrankter Haftung, Mannesmann Aktiengesellschaft. Active years: 1986-1994.

USPTO Granted Patents = 5 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.2

ph-index = 4

Forward Citations = 51(Granted Patents)


Company Filing History:


Years Active: 1986-1994

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5 patents (USPTO):Explore Patents

Title: Gebhard Tomalla: Innovator in Plasma Technology

Introduction

Gebhard Tomalla is a notable inventor based in Essen, Germany. He has made significant contributions to the field of plasma technology, holding a total of five patents. His work focuses on improving the efficiency and safety of plasma torches and burners.

Latest Patents

One of his latest patents is for a plasma torch designed to address the issue of parasite arcs that can adversely affect the operation of plasma torches. The invention proposes a novel method of distributing secondary passages uniformly between the annular passage for the plasma gas and the nozzle endpiece. This design helps to cool the nozzle end area and prevent the formation of electrical bridges caused by contaminants. Another significant patent is for a plasma burner that features an insulated tube and an annular passage to deliver auxiliary gas. This construction effectively avoids the formation of parasitic arcs, enhancing the overall performance of the burner.

Career Highlights

Throughout his career, Gebhard Tomalla has worked with prominent companies such as Fried. Krupp Gesellschaft mit beschränkter Haftung and Mannesmann Aktiengesellschaft. His experience in these organizations has contributed to his expertise in plasma technology and innovation.

Collaborations

He has collaborated with notable colleagues, including Hans J Bebber and Heinrich-Otto Rossner, further enriching his work in the field.

Conclusion

Gebhard Tomalla's innovative contributions to plasma technology demonstrate his commitment to advancing this field. His patents reflect a deep understanding of the challenges faced in plasma applications and offer effective solutions.

Profile summary based on public USPTO records.
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