Shenzhen, China

Ge Li

USPTO Granted Patents = 82 

 

 

Average Co-Inventor Count = 5.2

ph-index = 13

Forward Citations = 525(Granted Patents)

Forward Citations (Not Self Cited) = 513(Dec 10, 2025)


Location History:

  • Englewood, NJ (US) (1998 - 1999)
  • Franklin Park, NJ (US) (1997 - 2001)
  • Lawrenceville, NJ (US) (2002)
  • Plainsboro, NJ (US) (1998 - 2006)
  • QiXinLu, CN (2007)
  • Shanghai, CN (2005 - 2011)
  • Shenzhen, CN (2019 - 2022)
  • Xili Town, CN (2022)
  • Beijing, CN (2019 - 2024)
  • Guangdong, CN (2020 - 2024)

Company Filing History:


Years Active: 1997-2025

Loading Chart...
Loading Chart...
Loading Chart...
Areas of Expertise:
Point Cloud Compression
Neural Network
Gas Chromatography
Image Feature Extraction
Task-Driven Pruning
Odor Detection
Microneedle Technology
Deep Learning
Trace Detection
Pedestrian Detection
Sampling Devices
Cross-Media Retrieval
82 patents (USPTO):Explore Patents

Title: The Innovative Journey of Ge Li

Introduction: Ge Li is a visionary inventor hailing from Shenzhen, China, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Ge Li holds several patents in the areas of artificial intelligence, robotics, and renewable energy technologies, showcasing his commitment to pushing the boundaries of what is possible in the modern world.

Career Highlights: With a career spanning over two decades, Ge Li has worked with some of the leading tech companies in China, spearheading research and development projects that have led to significant advancements in various industries.

Collaborations: Throughout his career, Ge Li has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge sharing that has been instrumental in his success.

Conclusion: Ge Li's relentless pursuit of innovation and his passion for creating a better future through technology make him a true pioneer in the world of inventions. His work continues to inspire the next generation of inventors and innovators worldwide.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…