Chandler, AZ, United States of America

Gary W Read


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 50(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Innovations of Gary W Read in Chemical Vapor Deposition

Introduction

Gary W Read is an accomplished inventor based in Chandler, AZ (US). He has made significant contributions to the field of chemical vapor deposition, a crucial process in various manufacturing and research applications. His innovative approach has led to the development of a unique apparatus that enhances the efficiency and effectiveness of material deposition.

Latest Patents

Gary W Read holds a patent for an "Apparatus for chemical vapor deposition using an axially symmetric gas." This invention describes an improved technique for providing deposition materials to the growth surface within a chemical vapor deposition chamber. The apparatus ensures that the gas carrying deposition materials maintains axial symmetry, resulting in a uniform deposition of materials on the substrate. The gas is directed toward the substrate with a generally uniform perpendicular velocity, which is crucial for achieving consistent results. The design includes multiple apertures for gas introduction and a method for extracting gas that preserves axial symmetry. This innovation allows for convenient control of the deposition process and minimizes issues related to autodoping and particulate contamination.

Career Highlights

Gary W Read is associated with Epsilon, where he applies his expertise in chemical vapor deposition technologies. His work has been instrumental in advancing the capabilities of deposition processes, making them more reliable and efficient. With a focus on innovation, he continues to contribute to the field through his research and development efforts.

Collaborations

Gary has collaborated with notable colleagues such as Wiebe B deBoer and Klavs F Jensen. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

In summary, Gary W Read's contributions to the field of chemical vapor deposition through his innovative patent demonstrate his commitment to advancing technology. His work not only enhances the deposition process but also sets a foundation for future innovations in the industry.

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