Gary M DiDio

Title: Innovations of Gary M DiDio in Photovoltaic Technology

Introduction

Gary M DiDio is an accomplished inventor based in Drayton Plains, MI (US). He has made significant contributions to the field of photovoltaic technology, particularly through his innovative patent that enhances the efficiency of semiconductor layer deposition.

Latest Patents

Gary M DiDio holds a patent for a "Process gas introduction and channeling system to produce a profiled." This invention is designed for use with apparatuses that produce photovoltaic devices by depositing semiconductor layers onto continuously moving substrate material. The deposition apparatus includes a deposition chamber with a region for decomposing process gases and a manifold for introducing these gases into the chamber. The unique aspect of this system is that it directs process gases to flow through the decomposition region in a direction parallel to the substrate's travel, ensuring uniform deposition of semiconductor layers.

Career Highlights

Throughout his career, Gary has been associated with Energy Conversion Devices, Inc., where he has applied his expertise in developing advanced technologies for energy conversion. His work has been pivotal in improving the efficiency and effectiveness of photovoltaic devices.

Collaborations

Gary has collaborated with notable colleagues such as Joachim Doehler and Kevin R Hoffman, contributing to various projects that aim to advance the field of energy conversion and photovoltaic technology.

Conclusion

Gary M DiDio's innovative contributions to photovoltaic technology through his patented process gas introduction and channeling system exemplify his commitment to enhancing energy conversion methods. His work continues to influence the development of efficient semiconductor deposition techniques.