Gary M DeVries

Title: Innovations by Gary M DeVries

Introduction

Gary M DeVries is an accomplished inventor based in Fairport, NY (US). He is known for his significant contributions to the field of metrology, particularly in the measurement of aspheric surfaces. His innovative approach has led to advancements in accuracy and resolution in optical measurements.

Latest Patents

Gary M DeVries holds a patent for a "Method for accurate high-resolution measurements of aspheric surfaces." This patent describes a system that employs multiple methods for measuring surfaces or wavefronts from a test part with greatly improved accuracy. The methods focus on enhancing the measurement of higher spatial frequencies on aspheres. One notable method involves the calibration and control of the focusing components of a metrology gauge to maintain resolution and accuracy when repositioning the test part. Other methods extend conventional averaging techniques to suppress higher spatial-frequency structures, allowing for better disambiguation of the gauge's inherent bias.

Career Highlights

Gary is associated with QED Technologies International, Inc., where he applies his expertise in metrology. His work has been instrumental in developing systems that enhance measurement precision in optical components. His innovative methods have set new standards in the industry.

Collaborations

Gary has collaborated with notable colleagues such as Paul Murphy and Dragisha Miladinovic. Their combined efforts have contributed to the advancement of measurement technologies in the field.

Conclusion

Gary M DeVries is a prominent figure in the field of metrology, with a focus on high-resolution measurements of aspheric surfaces. His innovative methods and collaborative efforts continue to influence the industry positively.