Gary L Payne

Title: Innovations by Gary L Payne

Introduction

Gary L Payne is a notable inventor based in Sunnyvale, CA. He holds a total of 4 patents that showcase his contributions to the field of sputtering technology. His work has significantly impacted the efficiency and effectiveness of coating processes for various substrates.

Latest Patents

One of his latest patents is the "Sputtering Magnetron," which describes an apparatus designed to provide single or multi-layer coatings to the surfaces of multiple substrates. This innovative apparatus includes several buffer and sputtering chambers, allowing substrates to be transported at varying speeds while maintaining a constant rate for each pallet. Another significant patent is the "Heating System for High Throughput Sputtering," which outlines a high throughput sputtering apparatus that efficiently heats substrates to optimal temperatures for coating. This system ensures a uniform temperature profile and minimizes radiative heat losses, thereby enhancing film integrity during the sputtering process.

Career Highlights

Throughout his career, Gary has worked with prominent companies such as Conner Peripherals, Inc. and Seagate Technology Incorporated. His experience in these organizations has contributed to his expertise in developing advanced sputtering technologies.

Collaborations

Gary has collaborated with notable coworkers, including Dennis R Hollars and Delbert F Waltrip. Their combined efforts have furthered innovations in the field of sputtering technology.

Conclusion

Gary L Payne's contributions to sputtering technology through his patents and career experiences highlight his role as an influential inventor. His work continues to impact the industry positively.