Location History:
- Hartford, WI (US) (2017)
- Slinger, WI (US) (2009 - 2019)
Company Filing History:
Years Active: 2009-2019
Title: Gary Charles Sutcliffe: Innovator in Time and Attendance Tracking
Introduction
Gary Charles Sutcliffe is an accomplished inventor based in Slinger, Wisconsin. He holds a total of 4 patents that focus on innovative systems for tracking time and attendance in the workplace. His work has significantly contributed to improving efficiency and accountability in various work environments.
Latest Patents
One of Gary's latest patents is a system and method to track time and attendance of an individual at a workplace for a scheduled work shift. This system includes a location tracking mechanism that detects the presence of a portable electronic device carried by the individual. It also features a time clock system that records the registration time of the individual at the workplace. The main controller plays a crucial role by receiving electronic communications indicating the device's presence at the workplace. If the main controller does not detect the recording of the individual's registration time and the current time is at or later than the scheduled work shift start time, it automatically prompts the individual to acknowledge the need to record their registration time.
Career Highlights
Gary has worked with notable companies such as Api Healthcare Corporation and Api Software, Inc. His experience in these organizations has allowed him to develop and refine his innovative ideas, particularly in the realm of time and attendance tracking systems.
Collaborations
Some of Gary's coworkers include Bryan Dickerson and Jonathan Michael Tallon. Their collaboration has likely contributed to the development of his innovative solutions.
Conclusion
Gary Charles Sutcliffe is a notable inventor whose contributions to time and attendance tracking systems have made a significant impact in the workplace. His innovative patents reflect his commitment to enhancing efficiency and accountability in various work environments.