Company Filing History:
Years Active: 2022-2024
Title: Innovations of Gang Il Byun
Introduction
Gang Il Byun is a notable inventor based in Ulsan, South Korea. He has made significant contributions to the field of biometric technology, holding a total of 3 patents. His work focuses on innovative devices that measure biometric information, showcasing his expertise in the intersection of technology and health.
Latest Patents
One of his latest patents is an antenna device for measuring biometric information by using magnetic dipole resonance. This device includes a first and a second conductive wire, along with a third and a fourth conductive wire that are arranged along the boundary of a second area on a plane parallel to the first. Additionally, it features a fifth and a sixth conductive wire disposed along the boundary of a third area on a separate plane. The connection parts link the second conductive wires, enhancing the device's functionality.
Another significant patent is an implantable sensor driven by an alignment key, which is part of an implantable device that comprises the sensor. This biometric data measurement system allows for the insertion of the implantable device into the body, enabling the measurement of biometric data through the sensor that forms a magnetic dipole moment.
Career Highlights
Gang Il Byun is affiliated with the Ulsan National Institute of Science and Technology, where he continues to advance his research and development in biometric technologies. His work is characterized by a commitment to innovation and practical applications in health monitoring.
Collaborations
He collaborates with Franklin Don Bien, further enhancing the scope and impact of his inventions. Their partnership exemplifies the collaborative spirit in the field of scientific research and innovation.
Conclusion
Gang Il Byun's contributions to biometric technology through his patents reflect his dedication to improving health monitoring systems. His innovative work continues to pave the way for advancements in the field.