Company Filing History:
Years Active: 2013
Title: Gaetan Boisclair: Innovator in Gas Diffuser Technology
Introduction
Gaetan Boisclair is a notable inventor based in Longueuil, Canada. He has made significant contributions to the field of gas diffuser technology, particularly through his innovative patent. His work focuses on improving the efficiency and functionality of gas diffuser cases.
Latest Patents
Gaetan Boisclair holds a patent for a method titled "Channel inlet edge deburring for gas diffuser cases." This patent discloses a method of deburring channel inlet edges inside a cavity of a gas diffuser case. The diffuser case features multiple channels, each with an inner surface and an inlet edge. The method involves inserting a tool head with at least one nozzle into the cavity and ejecting abrasive particles towards the channel inlet edges. This process aims to decrease the radius of the edges and enhance the smoothness of the surfaces.
Career Highlights
Gaetan Boisclair is currently employed at Pratt & Whitney Canada Corporation, where he applies his expertise in gas diffuser technology. His work has contributed to advancements in the aerospace industry, particularly in the design and manufacturing of gas diffusers.
Collaborations
Gaetan collaborates with Ioan Sasu, a fellow professional in the field. Their combined efforts contribute to the innovative projects at Pratt & Whitney Canada Corporation.
Conclusion
Gaetan Boisclair's contributions to gas diffuser technology through his patent and work at Pratt & Whitney Canada Corporation highlight his role as an influential inventor. His innovative methods continue to impact the aerospace industry positively.