Glen Burnie, MD, United States of America

Gabor Feher

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2017-2018

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2 patents (USPTO):Explore Patents

Title: Gabor Feher: Innovator in TiO2-Based Scrubbing Granules

Introduction

Gabor Feher is a notable inventor based in Glen Burnie, MD (US). He has made significant contributions to the field of materials science, particularly in the development of TiO2-based scrubbing granules. With a total of two patents to his name, Feher's work focuses on innovative methods for creating and utilizing these granules in various industrial applications.

Latest Patents

Feher's latest patents describe the formulation and application of TiO2-based scrubbing granules. These granules consist of granulated TiO2 combined with an inorganic salt binder, which can range from about 0.5% to about 20% of the dry weight. The methods outlined in his patents include combining TiO2 particles with the inorganic salt binder to create a mixture, granulating this mixture, and then drying it to form the final product. The TiO2-based scrubbing granules are designed to effectively remove adherent deposits from the inner surfaces of reactors or heat exchangers during the production of TiO2 particles.

Career Highlights

Gabor Feher is currently employed at Cristal USA, Inc., where he continues to innovate in the field of materials science. His work has been instrumental in advancing the technology surrounding TiO2-based products, contributing to more efficient industrial processes.

Collaborations

Feher has collaborated with notable colleagues, including Venkata Ramana Reddy Sama and Kit Stacey Eremchuk. These partnerships have fostered a collaborative environment that enhances the development of innovative solutions in their field.

Conclusion

Gabor Feher's contributions to the development of TiO2-based scrubbing granules highlight his role as a significant inventor in materials science. His innovative methods and collaborative efforts continue to impact industrial applications positively.

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