Company Filing History:
Years Active: 2010
Title: Fumio Hoshi: Innovator in Semiconductor Technology
Introduction
Fumio Hoshi is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for fabricating semiconductor devices. His work has implications for the advancement of electronic components used in various applications.
Latest Patents
Fumio Hoshi holds a patent for a method for fabricating a semiconductor device. This patent outlines a process that includes forming a dielectric film on a semiconductor substrate, creating an opening in the dielectric film, and depositing tungsten (W) in the opening after performing a nitriding process on a refractory metal film. This innovative approach enhances the efficiency and performance of semiconductor devices.
Career Highlights
Hoshi is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to engage in cutting-edge research and development, contributing to the company's reputation for innovation in electronics and semiconductor technology.
Collaborations
Fumio Hoshi has collaborated with Hideto Matsuyama, a fellow innovator in the field. Their partnership has fostered advancements in semiconductor fabrication techniques, further enhancing the capabilities of the technologies they work on.
Conclusion
Fumio Hoshi's contributions to semiconductor technology through his innovative patent and collaboration with other experts highlight his role as a key figure in the industry. His work continues to influence the development of advanced electronic devices.