Company Filing History:
Years Active: 1994-2002
Title: Fumihiko Yuasa: Innovator in Photosensitive Compositions
Introduction
Fumihiko Yuasa is a prominent inventor based in Tokyo, Japan, known for his contributions to the field of photosensitive compositions. With a total of three patents, Yuasa has made significant advancements in the areas of photolithography and material science.
Latest Patents
Yuasa's latest patents reflect his expertise and innovation in the domain. One of his notable patents is titled "Photosensitive composition containing a dissolution inhibitor and an acid releasing compound." This invention provides a unique photosensitive composition that includes an acid-decomposable compound with specific substituents. These substituents are designed to produce a product that reacts with an alkali solution, forming functional groups such as —COO or —SO. Additionally, the composition features a compound that generates acid upon exposure to chemical radiation. When used as photoresist, Yuasa's compositions allow for the formation of fine resist patterns, which is crucial in various applications such as semiconductor manufacturing.
Career Highlights
Fumihiko Yuasa is affiliated with Kabushiki Kaisha Toshiba, where he has contributed to innovative projects and research. His work has fostered advancements in materials that are essential for the evolution of modern technology. His patents have played a pivotal role in enhancing the efficiency and precision of photosensitive materials.
Collaborations
Throughout his career, Yuasa has collaborated with esteemed colleagues such as Naoko Kihara and Tohru Ushirogouchi, contributing to a productive research environment that promotes innovation and technological growth. Their joint efforts have significantly impacted the development of effective photosensitive compositions.
Conclusion
Fumihiko Yuasa stands out as an influential inventor in the field of photosensitive compositions. His innovative work at Kabushiki Kaisha Toshiba, aided by his collaborations, highlights his commitment to advancing technology. With three patents under his name, Yuasa continues to influence the landscape of materials science and photolithography.