Location History:
- Kanagawa, JP (1993 - 1994)
- Ichihara, JP (2001 - 2005)
Company Filing History:
Years Active: 1993-2005
Title: Fujio Sawaragi: A Pioneer in Hard Coating Innovations
Introduction
Fujio Sawaragi, an accomplished inventor based in Kanagawa, Japan, has made significant contributions to the field of materials science through his innovative patents. With a total of seven patents to his name, Sawaragi specializes in advanced coating technologies that enhance the durability and functionality of various materials.
Latest Patents
Among his latest inventions is a patent for a hard coating composition and resin product featuring a hard coat that is formed using a combination of colloidal silica and a silicon compound with a fluoroalkyl group. This coating is designed to maintain water-repellency in outdoor environments while preventing stains and ensuring abrasion resistance over time. Additionally, he holds a patent for plastic lenses paired with a primer composition used for coating, showcasing his versatility and expertise in material applications.
Career Highlights
Fujio Sawaragi has built an impressive career through his work with notable companies, including Nippon Arc Co., Ltd. and Nipon Arc Co., Ltd. His talent for innovation has established him as a significant figure in the development of protective coatings, contributing to advancements that benefit various industries.
Collaborations
Throughout his career, Sawaragi has collaborated with esteemed professionals such as Masaaki Funaki and Hisayuki Kayanoki. These partnerships have fostered an environment of creativity and innovation, allowing for the exploration of new ideas and technologies in coating applications.
Conclusion
Fujio Sawaragi’s commitment to innovation in hard coating technologies has positioned him as a leading inventor in his field. His patents not only reflect his technical expertise but also the potential to impact industries through enhanced material properties. As he continues to develop new solutions, the legacy of his work will undoubtedly inspire future generations of inventors and researchers.