Company Filing History:
Years Active: 1989
Title: Friedrich Wienerroither: Innovator in Thin Layer Application Technology
Introduction
Friedrich Wienerroither is a notable inventor based in Munich, Germany. He has made significant contributions to the field of thin layer application technology, particularly through his innovative patent. His work is recognized for its potential impact on various industries, including electronics and materials science.
Latest Patents
Wienerroither holds a patent for an "Apparatus for applying thin layers onto a substrate." This invention involves the deposition of thin layers on substrates, such as silicon, within a series of evacuatable chambers. Each chamber is designed to admit an inert gas, and in cases of reactive sputtering deposition, a reactive gas is also introduced. The invention effectively prevents contamination between neighboring chambers with the reactive gas and ensures rapid charging of the chambers with new reactive gas. This is achieved through an inlet system that includes a pair of shut-off valves and a closable flow governor, all actuated in synchronism to maintain a stable gas flow.
Career Highlights
Wienerroither is associated with Siemens Aktiengesellschaft, a leading global technology company. His role at Siemens has allowed him to work on cutting-edge technologies and contribute to advancements in the field of thin film deposition.
Collaborations
Throughout his career, Wienerroither has collaborated with esteemed colleagues, including Armin Kohlhase and Georg Birkmaier. These collaborations have fostered innovation and have been instrumental in the development of new technologies.
Conclusion
Friedrich Wienerroither's contributions to thin layer application technology exemplify the spirit of innovation. His patent and work at Siemens highlight the importance of advancements in this field, paving the way for future developments.