Company Filing History:
Years Active: 2000
Title: The Innovative Contributions of Friedel Haese
Introduction
Friedel Haese is a notable inventor based in Stadecken-Elsheim, Germany. He has made significant contributions to the field of technology, particularly in the area of magnetron sputtering methods. His innovative approach has led to the development of a unique procedure and apparatus for applying carbon layers using reactive magnetron sputtering.
Latest Patents
Friedel Haese holds 1 patent for his invention titled "Magnetron sputtering method and apparatus utilizing a pulsed energy." This patent describes a process that includes sputtering at least two targets made of carbon in a reactive atmosphere with a pulsed energy feed. The method involves switching all targets on as an anode during a pattern period of the pulses, ensuring that at least one target remains switched as an anode at all times. Various embodiments of the invention include the detection and limitation of 'microarcs' and executing regeneration processes at predetermined time intervals.
Career Highlights
Friedel Haese is associated with the International Business Machines Corporation (IBM), where he has applied his expertise in developing advanced technologies. His work has contributed to the enhancement of sputtering techniques, which are crucial in various industrial applications.
Collaborations
Throughout his career, Friedel has collaborated with notable colleagues such as Peter Frach and Klaus Goedicke. These partnerships have fostered innovation and have been instrumental in advancing the technologies related to his patents.
Conclusion
Friedel Haese's contributions to the field of magnetron sputtering represent a significant advancement in technology. His innovative methods and collaborative efforts continue to influence the industry positively.