Frederick O Meyer, Iii

Title: Frederick O Meyer, III: Innovator in Semiconductor Polishing Technology

Introduction

Frederick O Meyer, III is a notable inventor based in Sherman, TX (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of wafer polishing. With a total of 2 patents to his name, Meyer has developed innovative methods that enhance the efficiency and quality of semiconductor manufacturing processes.

Latest Patents

Meyer’s latest patents focus on a method for polishing semiconductor wafer edges. This system and method involve rotating a stack of wafers against one or more polishing pads. The design ensures that both the edges and the sides of the wafer edges are polished to a mirror finish. The polishing pad features a series of grooves that allow the wafer edges to pass through, effectively polishing the sides. Alternatively, two pads can be utilized, one with grooves and one without, to achieve the desired finish.

Career Highlights

Frederick O Meyer, III is currently employed at Texas Instruments Corporation, a leading company in the semiconductor industry. His work at Texas Instruments has allowed him to apply his innovative ideas and contribute to advancements in semiconductor technology.

Collaborations

Meyer has collaborated with several talented individuals in his field, including Lawrence D Dyer and Anthony E Stephens. These collaborations have likely played a role in the development of his patented technologies.

Conclusion

Frederick O Meyer, III is a distinguished inventor whose work in semiconductor wafer polishing has made a significant impact on the industry. His innovative methods continue to advance the efficiency and quality of semiconductor manufacturing processes.