Location History:
- Stratford, NJ (US) (2004)
- Windsor, CT (US) (2011)
Company Filing History:
Years Active: 2004-2011
Title: Innovations of Frederick Hauer
Introduction
Frederick Hauer is a notable inventor based in Stratford, NJ (US). He has made significant contributions to the field of RF plasma applications, holding 2 patents that showcase his innovative spirit and technical expertise.
Latest Patents
One of Hauer's latest patents is an RF power control device designed for RF plasma applications. This invention provides an improved RF power control device that optimizes the feedback control voltage in the presence of harmonic and non-harmonic spurious frequencies. The system incorporates an oscillator and mixer, similar to those used in radio receiver applications, placed at the sampled output of the solid-state RF signal source used for plasma ignition. The sampled output is mixed to a low frequency and filtered to eliminate spurious frequencies generated in the non-linear plasma. This design allows the feedback power control to effectively ignore these spurious frequencies. The oscillator and mixer do not interfere with other desirable system characteristics, effectively isolating the feedback control voltage from changes in plasma spurious content. As a result, RF power can be delivered to the plasma with greater accuracy than conventional power control devices and methods would allow.
Career Highlights
Frederick Hauer is currently employed at Advanced Energy Industries, Inc., where he continues to develop innovative solutions in the field of RF plasma technology. His work has significantly advanced the capabilities of RF power control systems.
Collaborations
Hauer collaborates with talented professionals such as Theresa Beizer and Anton Mavretic, contributing to a dynamic and innovative work environment.
Conclusion
Frederick Hauer's contributions to RF plasma applications through his patents and work at Advanced Energy Industries, Inc. highlight his role as a significant inventor in the field. His innovations continue to push the boundaries of technology and improve the accuracy of RF power delivery systems.