Anaheim Hills, CA, United States of America

Frank X McKevitt


Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 102(Granted Patents)


Company Filing History:


Years Active: 1993-1996

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Frank X McKevitt

Introduction

Frank X McKevitt is a notable inventor based in Anaheim Hills, California. He has made significant contributions to the field of plasma deposition technology, holding three patents that showcase his innovative approach to enhancing substrate efficiency.

Latest Patents

Among his latest patents is the "Apparatus and Method for Plasma Deposition." This invention focuses on improving the structural attributes of substrates in a plasma jet deposition system. By incorporating features such as apertures and grooves, the design facilitates efficient deposition. The arrangement of substrate groups concerning the plasma beam is optimized to enhance deposition efficiency. Additionally, the invention addresses the need for effective evacuation of spent fluids, allowing fresh plasma to continuously contact the substrate surface. Another patent, titled "Apparatus for Plasma Deposition," shares similar principles, emphasizing the importance of structural attributes and efficient fluid management in the deposition process.

Career Highlights

Frank X McKevitt has established himself as a key figure in the field of plasma technology. His work at Celestech, Inc. has allowed him to develop and refine his innovative ideas, contributing to advancements in the industry. His patents reflect a deep understanding of the complexities involved in plasma deposition and a commitment to improving the technology.

Collaborations

Throughout his career, Frank has collaborated with notable colleagues, including Gordon L Cann and Cecil B Shepard, Jr. These partnerships have likely enriched his work and contributed to the successful development of his patents.

Conclusion

Frank X McKevitt's contributions to plasma deposition technology highlight his innovative spirit and dedication to advancing the field. His patents not only demonstrate his technical expertise but also pave the way for future developments in substrate efficiency.

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