Location History:
- Garryvoe, IE (2011)
- Penarth, GB (2012)
Company Filing History:
Years Active: 2011-2012
Title: Frank Swallow: Innovator in Plasma Technology
Introduction
Frank Swallow is a notable inventor based in Penarth, GB. He has made significant contributions to the field of plasma technology, holding a total of 2 patents. His work focuses on innovative solutions for treating materials in controlled gaseous environments.
Latest Patents
One of Frank's latest patents is a web sealing device. This apparatus is designed for treating a travelling web of material in a predetermined gaseous atmosphere. It comprises a chamber through which the moving web is transported, along with a means for introducing and controlling gas. The design minimizes the ingress of an external gas boundary layer around the web of material. Additionally, the apparatus includes re-circulation channels to maintain pressure balance within the chamber.
Another significant patent is the plasma generating electrode assembly. This assembly features a pair of spaced apart electrodes that form a plasma zone upon the introduction of a process gas. The design allows for the passage of gaseous, liquid, and solid precursors, with at least one electrode housing made from a non-porous dielectric material.
Career Highlights
Frank Swallow is currently employed at Dow Corning Ireland Limited, where he continues to innovate in the field of plasma technology. His work has implications for various applications, enhancing the efficiency and effectiveness of material treatment processes.
Collaborations
Throughout his career, Frank has collaborated with notable colleagues such as Peter Dobbyn and John Kennedy. These partnerships have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Frank Swallow's contributions to plasma technology through his innovative patents demonstrate his commitment to advancing material treatment processes. His work at Dow Corning Ireland Limited and collaborations with esteemed colleagues further highlight his impact in the field.